OBTAINING A HIGH-PERFORMANCE SEMICONDUCTOR USING A FLOW OF NEUTRONS

ASL MANBA
Ushbu maqola dastlab Multidisciplinary Journal of Science and Technology jurnalida nashr etilgan.

Matyoqubova.Sh.G', Xamidova.D.M, Abduvoxobova.M.O', Boboyev.A.Y, Xakimov.A.X (2026) OBTAINING A HIGH-PERFORMANCE SEMICONDUCTOR USING A FLOW OF NEUTRONS. Multidisciplinary Journal of Science and Technology.

To'liq matn arxivda mavjud emas — maqolaning asl manbasiga havola pastda berilgan.

Annotatsiya

In this article, we will consider the process of obtaining high-impedance semiconductor materials using a neutron flux and the study of their electrical properties. In particular, we will analyze such important parameters as electrical resistance, charge carrier concentration and their mobility in semiconductors. We will determine that nuclear reactions occurring in the semiconductor crystal lattice as a result of neutron irradiation lead to a change in the electrical properties of the material. The results of the research show that the possibilities of obtaining high-impedance semiconductors and their application in modern electronic devices have been further expanded.

Hujjat turi: Maqola
Mualliflar:
Muallif
Email
Matyoqubova.Sh.G'
UNSPECIFIED
Xamidova.D.M
UNSPECIFIED
Abduvoxobova.M.O'
UNSPECIFIED
Boboyev.A.Y
UNSPECIFIED
Xakimov.A.X
UNSPECIFIED
Jurnal / Nashr: Multidisciplinary Journal of Science and Technology
Nashriyot: Center for Tech and Media Research
Sana: 12 May 2026
DOI / ID: oai:ojs.pkp.sfu.ca:article/7378
Kalit so'zlar: yarimo‘tkazgich, neytronlar oqimi, solishtirma qarshilik, zaryad tashuvchilar, konsentratsiya, harakatchanlik.
Mavzular: ?? yarimo‘tkazgich, neytronlar oqimi, solishtirma qarshilik, zaryad tashuvchilar, konsentratsiya, harakatchanlik. ??
Eslatma: Imported from MJST Journal (OAI id oai:ojs.pkp.sfu.ca:article/7378)
URI: https://arxiv.universalpublishings.com/id/eprint/66766
Amallar
[pin missing: title]
[pin missing: title]